Published February 15, 1997 | Version v1
Journal article Metadata-only

Hydrogen migration in Lu at low temperatures

Creators

  • 1. Hiroshima Univ. (Japan). Faculty of Engineering
  • 2. Department of Physics, Japan Atomic Energy Research Institute, Tokai, Ibaraki 319-11 (Japan)

Description

The migration of hydrogen in Lu is determined by electrical resistance measurements in temperature range of 140-170 K. Disordered hydrogen atoms, which are formed by quenching, migrate to order during annealing in the above temperature range. The rate of the resistance decrease depends on the ordering rate of hydrogen. From the resistance decrease during isothermal annealings, the activation energy of hydrogen migration is determined as 0.43 eV (41.5 kJ mol-1). (orig.)

Additional details

Publishing Information

Journal Title
Journal of Alloys and Compounds
Journal Volume
248
Journal Issue
1-2
Journal Page Range
p. 77-79.
ISSN
0925-8388
CODEN
JALCEU

INIS

Country of Publication
Netherlands
Country of Input or Organization
Switzerland
INIS RN
28061014
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
ANNEALING; ELECTRIC CONDUCTIVITY; LUTETIUM HYDRIDES; ORDER-DISORDER TRANSFORMATIONS; TEMPERATURE RANGE 0065-0273 K
Descriptors DEC
ELECTRICAL PROPERTIES; HEAT TREATMENTS; HYDRIDES; HYDROGEN COMPOUNDS; LUTETIUM COMPOUNDS; PHASE TRANSFORMATIONS; PHYSICAL PROPERTIES; RARE EARTH COMPOUNDS; TEMPERATURE RANGE