Published May 10, 1988
| Version v1
Journal article
Molecular plating of cobalt and neodymium on thin aluminium foils
Description
The electrodeposition via the method of molecular plating (MP) has been specified so that chemical reactions with common backing materials become negligible. The water content in the organic electrolyte is clearly defined and any addition of acid is avoided. This MP-technique is tested by deposition of cobalt and neodymium on aluminium foils of thickness 2.5 and 5 μm. Quantitative results are presented for thin Co-layers and both thin and thick Nd-layers. (orig.)
Additional details
Publishing Information
- Journal Title
- Nucl. Instrum. Methods Phys. Res., Sect. A
- Journal Volume
- 268
- Journal Issue
- 1
- Series
- Nucl. Instrum. Methods Phys. Res., Sect. A.
- Journal Page Range
- 19-23
- ISSN
- 0168-9002
- CODEN
- NIMAE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- Netherlands
- INIS RN
- 19066342
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALUMINIUM; COBALT; ELECTROLYTES; ELECTROPLATING; FOILS; NEODYMIUM; WATER
- Descriptors DEC
- DEPOSITION; ELECTRODEPOSITION; ELECTROLYSIS; ELEMENTS; HYDROGEN COMPOUNDS; METALS; OXYGEN COMPOUNDS; PLATING; POLAR SOLVENTS; RARE EARTHS; SOLVENTS; SURFACE COATING; TRANSITION ELEMENTS