Published February 1, 2004 | Version v1
Journal article

Electrical and optical characterization of particle formation in an argon-silane capacitively coupled radio-frequency discharge

  • 1. Department of Physics, Eindhoven University of Technology, PO Box 5600 MB Eindhoven (Netherlands)

Description

Non-intrusive and accurate voltage, current and phase measurements of fundamental and harmonic radio-frequencies (rf) are compared with the temporal evolution plasma emission and scattered laser light from in situ formed particles in an argon-silane low-pressure rf discharge. The measured parameters show a corresponding behaviour during particle evolution. With increasing reactor temperature, not only is particle nucleation delayed in time but all subsequent phases of particle formation are slowed down as well. A close correspondence between the variations of the fourth harmonic of the current and the Si-H emission line is found. The results show that electrical parameters provide valuable clues to the particle growth starting from the nucleation phase, making them good candidates for process monitoring in industrial devices

Availability note (English)

Available online at http://stacks.iop.org/0963-0252/13/143/psst4_1_018.pdf or at the Web site for the journal Plasma Sources Science and Technology (ISSN 1361-6595) http://www.iop.org/

Additional details

Publishing Information

Journal Title
Plasma Sources Science and Technology
Journal Volume
13
Journal Issue
1
Journal Page Range
p. 143-149
ISSN
0963-0252

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
35024856
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY; S36: MATERIALS SCIENCE;
Descriptors DEI
CHEMICAL VAPOR DEPOSITION; DUSTS; HIGH-FREQUENCY DISCHARGES; NANOSTRUCTURES; NUCLEATION; PLASMA; PLASMA DIAGNOSTICS; POWDERS
Descriptors DEC
CHEMICAL COATING; DEPOSITION; ELECTRIC DISCHARGES; SURFACE COATING