Electrical and optical characterization of particle formation in an argon-silane capacitively coupled radio-frequency discharge
- 1. Department of Physics, Eindhoven University of Technology, PO Box 5600 MB Eindhoven (Netherlands)
Description
Non-intrusive and accurate voltage, current and phase measurements of fundamental and harmonic radio-frequencies (rf) are compared with the temporal evolution plasma emission and scattered laser light from in situ formed particles in an argon-silane low-pressure rf discharge. The measured parameters show a corresponding behaviour during particle evolution. With increasing reactor temperature, not only is particle nucleation delayed in time but all subsequent phases of particle formation are slowed down as well. A close correspondence between the variations of the fourth harmonic of the current and the Si-H emission line is found. The results show that electrical parameters provide valuable clues to the particle growth starting from the nucleation phase, making them good candidates for process monitoring in industrial devices
Availability note (English)
Available online at http://stacks.iop.org/0963-0252/13/143/psst4_1_018.pdf or at the Web site for the journal Plasma Sources Science and Technology (ISSN 1361-6595) http://www.iop.org/Additional details
Identifiers
- URL
- http://stacks.iop.org/0963-0252/13/143/psst4_1_018.pdf; http://www.iop.org/;
- DOI
- 10.1088/0963-0252/13/1/018;
- PII
- S0963-0252(04)71842-3;
Publishing Information
- Journal Title
- Plasma Sources Science and Technology
- Journal Volume
- 13
- Journal Issue
- 1
- Journal Page Range
- p. 143-149
- ISSN
- 0963-0252
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 35024856
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY; S36: MATERIALS SCIENCE;
- Descriptors DEI
- CHEMICAL VAPOR DEPOSITION; DUSTS; HIGH-FREQUENCY DISCHARGES; NANOSTRUCTURES; NUCLEATION; PLASMA; PLASMA DIAGNOSTICS; POWDERS
- Descriptors DEC
- CHEMICAL COATING; DEPOSITION; ELECTRIC DISCHARGES; SURFACE COATING