Published October 7, 1983
| Version v1
Journal article
Sputter-initiated resonance ionization spectroscopy
- 1. Atom Sciences Inc., Oak Ridge, TN (USA)
Description
A new technique, sputter-initiated resonance ionization spectroscopy (SIRIS), which provides an ultrasensitive analysis of solid samples for all elements except helium and neon is described in this paper. Sensitivities down to 1 part in 1012 should be available in routine SIRIS analysis, and greater sensitivities should be available for special cases. The basic concepts of this technology and early results in the development of the new SIRIS process and apparatus are presented. (Auth.)
Additional details
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 108
- Journal Issue
- 1
- Series
- Thin Solid Films.
- Journal Page Range
- 69-78
- ISSN
- 0040-6090
Conference
- Title
- International conference on metallurgical coatings.
- Dates
- 18-22 Apr 1983.
- Place
- San Diego, CA (USA).
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- Switzerland
- INIS RN
- 15012322
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- IONIZATION; LASER SPECTROSCOPY; QUANTITATIVE CHEMICAL ANALYSIS; SENSITIVITY; SPECIFICATIONS; SPUTTERING
- Descriptors DEC
- CHEMICAL ANALYSIS; SPECTROSCOPY