A comparison study of scratch and wear properties using atomic force microscopy

The patterning technique that uses an AFM (atomic force microscopy) tip as a scratch tool, also known as AFM scratching, has been a vital technique for nanofabrication because of its low cost and potential to reach a resolution into the sub-nanometer domain. The AFM scratching technique was first used to study the scratch characteristics of silicon, with an emphasis on establishing its scratchability or the nanoscale machinability. The effects of the scratch parameters, including the applied tip force and number of scratches, on the size of the scratched geometry were specifically evaluated. The primary property that measures the scratchability was identified and assessed. To illustrate its suitability and reliability, the value of the scratchability, based on the present Si scratching experiments, was compared with the values based on the data available in the literatures for different scratching conditions or for materials other than Si. Since AFM scratching is in some aspects similar to the nanoscale wear test, the scratchability property identified is also compared with two major wear resistance indicators, wear coefficient and hardness. All comparison results indicate that the scratchability property identified, the scratch ratio, is an appropriate manufacturability indicator for measuring the degree of the ease or difficulty of a material scratched by an AFM tip and more suitable than the wear coefficient and hardness to gauge the nanoscale AFM scratchability.