Published September 1, 2000
| Version v1
Report
Characterization of Be-based multilayer masks using x-ray reflectivity and auger electron spectroscopy
Description
no abstract available
Availability note (English)
Available from www.als.lbl.govAdditional details
Publishing Information
- Imprint Pagination
- [vp.]
- Report number
- LBNL/ALS--13668
Conference
- Title
- 20. Annual BACUS Symposium on Photomask Technology
- Dates
- 13-15 Sep 2000
- Place
- Monterey, CA (United States)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 33064567
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- No Abstract, Conference, Non-conventional Literature
- Descriptors DEI
- AUGER ELECTRON SPECTROSCOPY; BERYLLIUM; COATINGS; MASKING; REFLECTIVITY
- Descriptors DEC
- ALKALINE EARTH METALS; ELECTRON SPECTROSCOPY; ELEMENTS; METALS; OPTICAL PROPERTIES; PHYSICAL PROPERTIES; SPECTROSCOPY; SURFACE PROPERTIES
Optional Information
- Contract/Grant/Project number
- AC03-76SF00098
- Funding organization
- US Department of Energy (United States)