Published May 2006
| Version v1
Journal article
Plasma immersion ion implantation into insulating materials
Creators
- 1. Harbin Inst. of Technology, Harbin (China). School of Materials Science and Engineering
- 2. Department of Physics and Materials Science, City University of Hong Kong, Hong Kong (China)
Description
Plasma immersion ion implantation (PIII) is an effective surface modification tool. During PIII processes, the objects to be treated are immersed in plasmas and then biased to negative potential. Consequently the plasma sheath forms and ion implantation may be performed. The pre-requirement of plasma implantation is that the object is conductive. So it seems difficult to treat the insulating materials. The paper focuses on the possibilities of plasma implantation into insulting materials and presents some examples. (authors)
Additional details
Publishing Information
- Journal Title
- Nuclear Techniques
- Journal Volume
- 29
- Journal Issue
- 5
- Journal Page Range
- p. 335-338
- ISSN
- 0253-3219
INIS
- Country of Publication
- China
- Country of Input or Organization
- China
- INIS RN
- 37107854
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ELECTRICAL INSULATORS; ION IMPLANTATION; MODIFICATIONS; PLASMA; PLASMA SHEATH; POTENTIALS; SURFACES; TOOLS
- Descriptors DEC
- ELECTRICAL EQUIPMENT; EQUIPMENT
Optional Information
- Notes
- 3 figs., 12 refs.