Published May 2006 | Version v1
Journal article

Plasma immersion ion implantation into insulating materials

  • 1. Harbin Inst. of Technology, Harbin (China). School of Materials Science and Engineering
  • 2. Department of Physics and Materials Science, City University of Hong Kong, Hong Kong (China)

Description

Plasma immersion ion implantation (PIII) is an effective surface modification tool. During PIII processes, the objects to be treated are immersed in plasmas and then biased to negative potential. Consequently the plasma sheath forms and ion implantation may be performed. The pre-requirement of plasma implantation is that the object is conductive. So it seems difficult to treat the insulating materials. The paper focuses on the possibilities of plasma implantation into insulting materials and presents some examples. (authors)

Additional details

Publishing Information

Journal Title
Nuclear Techniques
Journal Volume
29
Journal Issue
5
Journal Page Range
p. 335-338
ISSN
0253-3219

INIS

Country of Publication
China
Country of Input or Organization
China
INIS RN
37107854
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Descriptors DEI
ELECTRICAL INSULATORS; ION IMPLANTATION; MODIFICATIONS; PLASMA; PLASMA SHEATH; POTENTIALS; SURFACES; TOOLS
Descriptors DEC
ELECTRICAL EQUIPMENT; EQUIPMENT

Optional Information

Notes
3 figs., 12 refs.