Sub-harmonic ECR heating of microwave plasma in a multicusp magnetic bottle: frequency dependence
Creators
- 1. Department of Physics, National Institute of Technology Jamshedpur, Jamshedpur 831014 (India)
- 2. Department of Physics, Indian Institute of Technology Kanpur, Kanpur 208016 (India)
Description
The microwave discharge plays an important role in ECR ion sources (ECRIS) as well as in material synthesis and processing. There has been an interest in increasing microwave frequency for enhancing production of the higher charge states in plasmas. This requires energetic electrons in the source and hence it is important to investigate plasma properties like plasma density (ne), electron temperature (Te) and its electron energy distribution function (EEDF). There are studies on effect of input frequency on self-generated plasmas but are limited in megahertz only. However, the input frequency commonly employed in ECRIS lies in GHz range and hence dependence of such frequencies on the resulting plasma properties has remained unexplored. In the present study, detailed investigation of ne, Te and EEDF of microwave plasmas as a function of the driving wave frequency (6 – 11 GHz) is presented
Additional details
Publishing Information
- Publisher
- University of Lucknow
- Imprint Place
- Lucknow (India)
- ISBN
- 9789353918910
- Imprint Title
- Proceedings of the twelfth international conference on plasma science and applications - plasma in the service of mankind: book of abstracts
- Imprint Pagination
- 278 p.
- Journal Page Range
- p. 58-59
Conference
- Title
- 12. international conference on plasma science and applications - plasma in the service of mankind
- Acronym
- ICPSA-2019
- Dates
- 11-14 Nov 2019
- Place
- Lucknow (India)
INIS
- Country of Publication
- India
- Country of Input or Organization
- India
- INIS RN
- 55089557
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ECR ION SOURCES; PLASMA DENSITY; PLASMA EXPANSION; PLASMA FOCUS
- Descriptors DEC
- EXPANSION; ION SOURCES