Published November 2019 | Version v1
Book

Sub-harmonic ECR heating of microwave plasma in a multicusp magnetic bottle: frequency dependence

  • 1. Department of Physics, National Institute of Technology Jamshedpur, Jamshedpur 831014 (India)
  • 2. Department of Physics, Indian Institute of Technology Kanpur, Kanpur 208016 (India)

Description

The microwave discharge plays an important role in ECR ion sources (ECRIS) as well as in material synthesis and processing. There has been an interest in increasing microwave frequency for enhancing production of the higher charge states in plasmas. This requires energetic electrons in the source and hence it is important to investigate plasma properties like plasma density (ne), electron temperature (Te) and its electron energy distribution function (EEDF). There are studies on effect of input frequency on self-generated plasmas but are limited in megahertz only. However, the input frequency commonly employed in ECRIS lies in GHz range and hence dependence of such frequencies on the resulting plasma properties has remained unexplored. In the present study, detailed investigation of ne, Te and EEDF of microwave plasmas as a function of the driving wave frequency (6 – 11 GHz) is presented

Part of:
Proceedings of the twelfth international conference on plasma science and applications - plasma in the service of mankind: book of abstracts

Additional details

Publishing Information

Publisher
University of Lucknow
Imprint Place
Lucknow (India)
ISBN
9789353918910
Imprint Title
Proceedings of the twelfth international conference on plasma science and applications - plasma in the service of mankind: book of abstracts
Imprint Pagination
278 p.
Journal Page Range
p. 58-59

Conference

Title
12. international conference on plasma science and applications - plasma in the service of mankind
Acronym
ICPSA-2019
Dates
11-14 Nov 2019
Place
Lucknow (India)

INIS

Country of Publication
India
Country of Input or Organization
India
INIS RN
55089557
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ECR ION SOURCES; PLASMA DENSITY; PLASMA EXPANSION; PLASMA FOCUS
Descriptors DEC
EXPANSION; ION SOURCES

Optional Information