Published January 2006 | Version v1
Report Restricted

Ion beam mixing at Bi-SiO2 interfaces

Creators

  • 1. Osaka Prefecture Univ., Sakai, Osaka (Japan)
  • 2. Japan Atomic Energy Research Inst., Tokai Research Establishment, Tokai, Ibaraki (Japan)

Description

no abstract available

Files

Restricted

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Part of:
JAERI TANDEM annual report 2004. April 1, 2004 - March 31, 2005

Additional details

Publishing Information

Imprint Title
JAERI TANDEM annual report 2004. April 1, 2004 - March 31, 2005
Imprint Pagination
157 p.
Journal Page Range
p. 75-76
Report number
JAEA-Review--2005-004

INIS

Country of Publication
Japan
Country of Input or Organization
Japan
INIS RN
37077536
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
No Abstract
Descriptors DEI
BISMUTH; ELECTRONS; EXCITATION; GOLD IONS; INTERFACES; ION BEAMS; IRRADIATION; JAERI TANDEM ACCELERATOR; MEV RANGE 100-1000; MIXING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICA; SUBSTRATES; XENON IONS
Descriptors DEC
ACCELERATORS; BEAMS; CHARGED PARTICLES; ELECTROSTATIC ACCELERATORS; ELEMENTARY PARTICLES; ELEMENTS; ENERGY RANGE; ENERGY-LEVEL TRANSITIONS; FERMIONS; IONS; LEPTONS; METALS; MEV RANGE; MINERALS; OXIDE MINERALS; SPECTROSCOPY; TANDEM ELECTROSTATIC ACCELERATORS; VAN DE GRAAFF ACCELERATORS

Optional Information

Notes
3 refs., 1 fig.