Published July 9, 2010 | Version v1
Journal article

Transport of Deposited Atoms throughout Strain-Mediated Self-Assembly

  • 1. Max Planck Institute of Microstructure Physics, Weinberg 2, Halle (Saale), 06120 Germany (Germany)
  • 2. School of Fundamental Science and Technology, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama 223-8522 (Japan)
  • 3. Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720 (United States)
  • 4. Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, California 94720-1760 (United States)

Description

Using enriched isotopes, we developed a method to elucidate the long-standing issue of Ge transport governing the strain-driven self-assembly. Here 76Ge was employed to form the 2D metastable layer on a Si(001) surface, while the 3D transition and growth were completed by additional evaporation of 70Ge. This isotope tracing combined with the analysis of the Ge-Ge LO phonon enables the tracking of the origin of Ge atoms and their flow towards the growing islands. This atomic transport was quantified based on the quasiharmonic approximation of Ge-Ge vibrations and described using a rate equation model.

Additional details

Publishing Information

Journal Title
Physical Review Letters
Journal Volume
105
Journal Issue
2
Journal Page Range
p. 026101-026101.4
ISSN
0031-9007
CODEN
PRLTAO

Optional Information

Notes
(c) 2010 The American Physical Society