Negative-hydrogen-ion sources
Description
There are two main areas of negative hydrogen ion applications: injection into high energy accelerators and production of beams of energetic hydrogen atoms for fusion devices. In both cases, the ease with which the charge state of negative ions can be changed by either single or double electron stripping is the reason that made their application attractive. In tandem accelerators, the final energy of H+ ions is twice as high as it would correspond to the terminal voltage, in circular accelerators (synchrotrons, storage rings) injection of H+ ions by full stripping of H- ions in a foil inside the ring is not limited by the Liouville's theorem and results in a higher phase space density than achieved by direct H+ injection. Finally, beams of hydrogen atoms at energies above 100 keV, which will be required for plasma heating and current drive in future fusion devices, can efficiently be produced only by acceleration of negative ions and their subsequent neutralization
Availability note (English)
MF available from INIS under the Report Number; Available from NTIS, PC A02/MF A01 as DE83015387.Files
14800447.pdf
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Additional details
Publishing Information
- Imprint Pagination
- 13 p.
- Report number
- BNL--33354
Conference
- Title
- 7. symposium on sources and ion assisted technology and 4. international conference on ion and plasma assisted techniques.
- Dates
- 12-16 Sep 1983.
- Place
- Kyoto (Japan).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 14800447
- Subject category
- S74: ATOMIC AND MOLECULAR PHYSICS;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- BEAM CURRENTS; CHARGE EXCHANGE; HYDROGEN IONS 1 MINUS; HYDROGEN 1 MINUS BEAMS; ION SOURCES; MAGNETRONS; PENNING ION SOURCES; REVIEWS
- Descriptors DEC
- ANIONS; BEAMS; CHARGED PARTICLES; CURRENTS; DOCUMENT TYPES; ELECTRON TUBES; ELECTRONIC EQUIPMENT; EQUIPMENT; HYDROGEN IONS; ION BEAMS; IONS; MICROWAVE EQUIPMENT; MICROWAVE TUBES
Optional Information
- Secondary number(s)
- CONF-830920--4.