Published 1983 | Version v1
Report Open

Negative-hydrogen-ion sources

Description

There are two main areas of negative hydrogen ion applications: injection into high energy accelerators and production of beams of energetic hydrogen atoms for fusion devices. In both cases, the ease with which the charge state of negative ions can be changed by either single or double electron stripping is the reason that made their application attractive. In tandem accelerators, the final energy of H+ ions is twice as high as it would correspond to the terminal voltage, in circular accelerators (synchrotrons, storage rings) injection of H+ ions by full stripping of H- ions in a foil inside the ring is not limited by the Liouville's theorem and results in a higher phase space density than achieved by direct H+ injection. Finally, beams of hydrogen atoms at energies above 100 keV, which will be required for plasma heating and current drive in future fusion devices, can efficiently be produced only by acceleration of negative ions and their subsequent neutralization

Availability note (English)

MF available from INIS under the Report Number; Available from NTIS, PC A02/MF A01 as DE83015387.

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Additional details

Publishing Information

Imprint Pagination
13 p.
Report number
BNL--33354

Conference

Title
7. symposium on sources and ion assisted technology and 4. international conference on ion and plasma assisted techniques.
Dates
12-16 Sep 1983.
Place
Kyoto (Japan).

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
14800447
Subject category
S74: ATOMIC AND MOLECULAR PHYSICS;
Resource subtype / Literary indicator
Conference
Descriptors DEI
BEAM CURRENTS; CHARGE EXCHANGE; HYDROGEN IONS 1 MINUS; HYDROGEN 1 MINUS BEAMS; ION SOURCES; MAGNETRONS; PENNING ION SOURCES; REVIEWS
Descriptors DEC
ANIONS; BEAMS; CHARGED PARTICLES; CURRENTS; DOCUMENT TYPES; ELECTRON TUBES; ELECTRONIC EQUIPMENT; EQUIPMENT; HYDROGEN IONS; ION BEAMS; IONS; MICROWAVE EQUIPMENT; MICROWAVE TUBES

Optional Information

Secondary number(s)
CONF-830920--4.