Published 2008 | Version v1
Journal article Metadata-only

Tailoring WO3 thin layers using spray pyrolysis technique

Creators

  • 1. Product Design for Sustainable Development, Transilvania University, Brasov (Romania)

Description

The deposition technique is responsible for the morphological and crystalline properties of the thin films obtained by spray pyrolysis. The influence of the deposition parameters on the WO3 films properties is presented. The main characterisation concerns the topography (AFM), crystalline parameters (XRD), surface tensions (contact angle) and opto-electronic properties. Due to the changes on the deposition parameter, dense and porous WO3 films were obtained with radically different interface properties. (copyright 2008 WILEY-VCH Verlag GmbH and Co. KGaA, Weinheim) (orig.)

Availability note (English)

Available from: http://dx.doi.org/10.1002/pssc.200779410

Additional details

Identifiers

DOI
10.1002/pssc.200779410;

Publishing Information

Journal Title
Physica Status Solidi. C, Conferences
Journal Volume
5
Journal Issue
11
Journal Page Range
p. 3499-3502
ISSN
1610-1634

Conference

Title
Symposium B: Chemical and Electrochemical synthesis of advaced matrials and nanostructures on solid surfaces: Growth mechanisms, characterizations and applications
Acronym
2007 E-MRS fall meeting
Dates
28 May - 1 Jun 2007
Place
Strasbourg (France)

INIS

Country of Publication
Germany
Country of Input or Organization
Germany
INIS RN
39114970
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ABSORPTION SPECTRA; ATOMIC FORCE MICROSCOPY; BAND THEORY; CRYSTALS; ELECTRONIC STRUCTURE; ENERGY GAP; ENERGY SPECTRA; INTERFACES; LAYERS; NANOSTRUCTURES; PARTICLE SIZE; PHOTOCURRENTS; POROUS MATERIALS; PYROLYSIS; SPRAY COATING; SURFACE TENSION; THIN FILMS; TUNGSTEN OXIDES; ULTRAVIOLET SPECTRA; VISIBLE SPECTRA; X-RAY DIFFRACTION
Descriptors DEC
CHALCOGENIDES; CHEMICAL REACTIONS; COHERENT SCATTERING; CURRENTS; DECOMPOSITION; DEPOSITION; DIFFRACTION; ELECTRIC CURRENTS; FILMS; MATERIALS; MICROSCOPY; OXIDES; OXYGEN COMPOUNDS; REFRACTORY METAL COMPOUNDS; SCATTERING; SIZE; SPECTRA; SURFACE COATING; SURFACE PROPERTIES; THERMOCHEMICAL PROCESSES; TRANSITION ELEMENT COMPOUNDS; TUNGSTEN COMPOUNDS

Optional Information

Notes
With 5 figs., 2 tabs., 18 refs.. SICI: 1610-1634(200811)5:11<3499::AID-PSSC200779410>3.0.TX;2-2