Advances in superconducting quantum electronic microcircuit fabrication
Description
Standard microelectronic fabrication techniques were utilized to produce batch quantities of superconducting quantum electronic devices and circuits. The over-all goal is a fabrication technology yielding circuits that are rugged, stable, and capable of being fabricated controllably and reproducibly in sizeable quantities. Progress toward this goal is presented, with primary emphasis on the most recent work, which includes the use of electron-beam lithography and techniques of hybrid microelectronics. Several prototype microcircuits were successfully fabricated. These microcircuits are formed in a thin-film parent material consisting of layers of superconducting and normal metals, and use proximity effect structures as the active circuit elements
Additional details
Additional titles
- Augmented title (English)
- Batch quantity production
Identifiers
Publishing Information
- Journal Title
- IEEE Transactions on Magnetics
- Journal Volume
- 11
- Journal Issue
- 2
- Series
- IEEE Trans. Magn.
- Journal Page Range
- 778-781
- ISSN
- 0018-9464
Conference
- Title
- Applied superconductivity conference.
- Dates
- 30 Sep 1974.
- Place
- Oakbrook, Illinois, USA.
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 7248952
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ELECTRON BEAMS; ETCHING; FABRICATION; JOSEPHSON JUNCTIONS; MICROELECTRONICS; PERFORMANCE; PRODUCTION; PROXIMITY EFFECT; RELIABILITY; STABILITY
- Descriptors DEC
- BEAMS; LEPTON BEAMS; PARTICLE BEAMS; SEMICONDUCTOR JUNCTIONS; SURFACE FINISHING
Optional Information
- Notes
- See CONF-740957--.; Updated automatically by Metadata and Full-Text Enrichment Agent