Published December 3, 2008 | Version v1
Journal article

The synthesis and structure of suspended ultra-thin Si3N4 nanosheets

  • 1. Quantum Beam Science Directorate, Japan Atomic Energy Agency, Tokai-mura, Ibaraki-ken 319-1195 (Japan)

Description

Suspended Si3N4 nanosheets at least 4 μm in width and ranging from 1.5 to 4 nm in thickness were successfully synthesized for the first time. Several of those nanosheets had scrolled edges due to being ultra-thin. According to transmission electron microscopy (TEM) and atomic force microscopy (AFM) observations, the Si3N4 nanosheets exhibit microscopic corrugations in the range of several tens of nanometres. In addition, the directions of the microscopic corrugations were not random, but instead parallel to specific crystal orientations.

Availability note (English)

Available from http://dx.doi.org/10.1088/0957-4484/19/48/485601

Additional details

Identifiers

DOI
10.1088/0957-4484/19/48/485601;
PII
S0957-4484(08)85487-6;

Publishing Information

Journal Title
Nanotechnology (Print)
Journal Volume
19
Journal Issue
48
Journal Page Range
[6 p.]
ISSN
0957-4484

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
41013794
Subject category
S77: NANOSCIENCE AND NANOTECHNOLOGY;
Descriptors DEI
ATOMIC FORCE MICROSCOPY; CRYSTALS; GRAIN ORIENTATION; NANOSTRUCTURES; SHEETS; SILICON NITRIDES; SYNTHESIS; TRANSMISSION ELECTRON MICROSCOPY
Descriptors DEC
ELECTRON MICROSCOPY; MICROSCOPY; MICROSTRUCTURE; NITRIDES; NITROGEN COMPOUNDS; ORIENTATION; PNICTIDES; SILICON COMPOUNDS