Published December 3, 2008
| Version v1
Journal article
The synthesis and structure of suspended ultra-thin Si3N4 nanosheets
Creators
- 1. Quantum Beam Science Directorate, Japan Atomic Energy Agency, Tokai-mura, Ibaraki-ken 319-1195 (Japan)
Description
Suspended Si3N4 nanosheets at least 4 μm in width and ranging from 1.5 to 4 nm in thickness were successfully synthesized for the first time. Several of those nanosheets had scrolled edges due to being ultra-thin. According to transmission electron microscopy (TEM) and atomic force microscopy (AFM) observations, the Si3N4 nanosheets exhibit microscopic corrugations in the range of several tens of nanometres. In addition, the directions of the microscopic corrugations were not random, but instead parallel to specific crystal orientations.
Availability note (English)
Available from http://dx.doi.org/10.1088/0957-4484/19/48/485601Additional details
Identifiers
- DOI
- 10.1088/0957-4484/19/48/485601;
- PII
- S0957-4484(08)85487-6;
Publishing Information
- Journal Title
- Nanotechnology (Print)
- Journal Volume
- 19
- Journal Issue
- 48
- Journal Page Range
- [6 p.]
- ISSN
- 0957-4484
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 41013794
- Subject category
- S77: NANOSCIENCE AND NANOTECHNOLOGY;
- Descriptors DEI
- ATOMIC FORCE MICROSCOPY; CRYSTALS; GRAIN ORIENTATION; NANOSTRUCTURES; SHEETS; SILICON NITRIDES; SYNTHESIS; TRANSMISSION ELECTRON MICROSCOPY
- Descriptors DEC
- ELECTRON MICROSCOPY; MICROSCOPY; MICROSTRUCTURE; NITRIDES; NITROGEN COMPOUNDS; ORIENTATION; PNICTIDES; SILICON COMPOUNDS