Depth profiling of multilayers at elevated temperatures and at changeable ion beam parameters

The kinetics of surface composition during ion beam depth profiling of multilayers is considered. The experimental results obtained by AES at elevated temperatures and at changeable ion energy and incident angle are modelled. In order to find qualitative differences in depth profile spectra produced by surface processes and bulk processes separately, the modelling is performed by two models. First one includes the surface roughness development without ion mixing in bulk and second one includes ion mixing without surface roughness development. The origin of peak asymmetry is analysed by both models. As the main conclusion is that both processes may give qualitatively very similar effects in depth profile spectra and the interpretation of experimental results can be done only after quantitative theoretical analysis