Published December 15, 2017 | Version v1
Journal article

Stability of the Al/TiB2 interface and doping effects of Mg/Si

  • 1. Joint Laboratory of Nuclear Materials and Service Safety, Graduate School at Shenzhen, Tsinghua University, Shenzhen 518055 (China)
  • 2. School of Materials Science and Engineering, Tsinghua University, Beijing 100084 (China)
  • 3. Entropic Interface Group, Engineering Product Development, Singapore University of Technology and Design, 8 Somapah Road, Singapore 487372 (Singapore)

Description

Highlights: • The interfacial energies of Al/TiB2 interfaces are investigated and the results support the reported grain refinement mechanisms in Al-Si alloys. • The segregation behaviors of the doped Mg/Si atoms to the interfaces are studied. Segregation occurs when the interface is rich in B. • By comparing the work of separation, we find that the interfaces will both weaken after doping Mg/Si, thus hinder the formation of TiB2. - Abstract: The Al/TiB2 interface is of significant importance in controlling the mechanical properties of Al-B4C composites and tuning the heterogeneous nucleation of Al/Si alloys in industry. Its stability and bonding conditions are critical for both purposes. In this paper, the interfacial energies were investigated by first-principles calculations, and the results support the reported grain refinement mechanisms in Al/Si alloys. Moreover, to improve the mechanical properties of the interface, Mg and Si were doped at the interface, and our simulations show that the two interfaces will both weaken after doping Mg/Si, thus the formation of TiB2 is inhibited. As a result, the processability of the Al-B4C composites may be improved. Our results provide a theoretical basis and guidance for practical applications.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2017.06.227

Additional details

Identifiers

DOI
10.1016/j.apsusc.2017.06.227;
PII
S0169-4332(17)31882-2;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
425
Journal Page Range
p. 639-645
ISSN
0169-4332
CODEN
ASUSEE

Optional Information

Copyright
Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.