Characteristics of multilevel storage and switching dynamics in resistive switching cell of Al2O3/HfO2/Al2O3 sandwich structure
Creators
- 1. School of Electronic Science and Engineering, The State Key Laboratory of Solid State Microstructures, Nanjing University, Nanjing 210093 (China)
- 2. The Quantum Nanoelectronics Research Center, Tokyo Institute of Technology, Tokyo 152-8552 (Japan)
Description
We reported an Al2O3/HfO2/Al2O3 sandwich structure resistive switching device with significant improvement of multilevel cell (MLC) operation capability, which exhibited that four stable and distinct resistance states (one low resistance state and three high resistance states) can be achieved by controlling the Reset stop voltages (V Reset-stop) during the Reset operation. The improved MLC operation capability can be attributed to the R HRS/R LRS ratio enhancement resulting from increasing of the series resistance and decreasing of leakage current by inserting two Al2O3 layers. For the high-speed switching applications, we studied the initial switching dynamics by using the measurements of the pulse width and amplitude dependence of Set and Reset switching characteristics. The results showed that under the same pulse amplitude conditions, the initial Set progress is faster than the initial Reset progress, which can be explained by thermal-assisted electric field induced rupture model in the oxygen vacancies conductive filament. Thus, proper combination of varying pulse amplitude and width can help us to optimize the device operation parameters. Moreover, the device demonstrated ultrafast program/erase speed (10 ns) and good pulse switching endurance (105 cycles) characteristics, which are suitable for high-density and fast-speed nonvolatile memory applications. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1361-6463/aa9c15Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Physics. D, Applied Physics
- Journal Volume
- 51
- Journal Issue
- 2
- Journal Page Range
- [7 p.]
- ISSN
- 0022-3727
- CODEN
- JPAPBE
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 52112248
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALUMINIUM OXIDES; ELECTRIC FIELDS; ELECTRIC POTENTIAL; HAFNIUM OXIDES; LAYERS; LEAKAGE CURRENT; OXYGEN; PULSES; VACANCIES
- Descriptors DEC
- ALUMINIUM COMPOUNDS; CHALCOGENIDES; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; CURRENTS; ELECTRIC CURRENTS; ELEMENTS; HAFNIUM COMPOUNDS; NONMETALS; OXIDES; OXYGEN COMPOUNDS; POINT DEFECTS; REFRACTORY METAL COMPOUNDS; TRANSITION ELEMENT COMPOUNDS