Lanthanide-doped silica layers via the sol-gel process: luminescence and process parameters
Creators
- 1. Department of Chemical Engineering, Fachhochschule Muenster-University of Applied Sciences, Stegerwaldstrasse 39, 48565 Steinfurt (Germany)
Description
The introduction of luminescent materials into a sol-gel-derived silica layer is a promising way for the creation of optical applications on the basis of UV-sensitive waveguides. In this work, the preparation of tetraethylorthosilicate (TEOS)-derived silica layers doped with terbiumtrisbenzoate is described. Results with respect to the layer thickness, the photoluminescence of doped bulk silica materials compared to doped silica layers, the influence of ultrasonic treatment during preparation, and the temperature stability are given. Atomic force microscopy measurements show that the withdrawal speed during the sol-gel process can be optimized in order to minimize the surface roughness of the films deposited. Nanoindentation experiments reveal that the hardness of layers cured at 200 deg C is comparable to that of ordinary glass
Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2004.08.116;
- PII
- S0040-6090(04)01266-0;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 474
- Journal Issue
- 1-2
- Journal Page Range
- p. 31-35
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 36112490
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ATOMIC FORCE MICROSCOPY; COATINGS; DOPED MATERIALS; FILMS; LAYERS; PHOTOLUMINESCENCE; RARE EARTHS; SILICA; SOL-GEL PROCESS; TEMPERATURE RANGE 0400-1000 K
- Descriptors DEC
- ELEMENTS; EMISSION; LUMINESCENCE; MATERIALS; METALS; MICROSCOPY; MINERALS; OXIDE MINERALS; PHOTON EMISSION; TEMPERATURE RANGE
Optional Information
- Copyright
- Copyright (c) 2004 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.