Published August 1995
| Version v1
Journal article
Kinetics of nickel films deposition from Ni(HL)2 vapors
- 1. AN SSSR, Novosibirsk (Russian Federation). Inst. Neorganicheskoj Khimii
Description
Ni films on silicon substrates of Ni(HL)2 complex compound vapours are grown by molecular epitaxy method. It is shown that Ni(HL)2 vapour decomposition reaction occurs in the kinetic regime, but possesses a relatively low apparent activation energy. 5 refs.; 2 figs
Additional details
Additional titles
- Original title (Russian)
- О кинетике осаждения пленок никеля из паров комплексного соединения Ни(HL)
Publishing Information
- Journal Title
- Neorganicheskie Materialy
- Journal Volume
- 31
- Journal Issue
- 8
- Journal Page Range
- p. 1117-1118.
- ISSN
- 0002-337X
- CODEN
- NEOMB8
INIS
- Country of Publication
- Russian Federation
- Country of Input or Organization
- Russian Federation
- INIS RN
- 27021531
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- CHEMICAL REACTION KINETICS; CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY; FILMS; NICKEL; NICKEL COMPLEXES; SILICON; SUBSTRATES; THICKNESS
- Descriptors DEC
- CHEMICAL COATING; COMPLEXES; DEPOSITION; DIMENSIONS; ELECTRICAL PROPERTIES; ELEMENTS; KINETICS; METALS; PHYSICAL PROPERTIES; REACTION KINETICS; SEMIMETALS; SURFACE COATING; TRANSITION ELEMENT COMPLEXES; TRANSITION ELEMENTS