Published July 2002 | Version v1
Journal article

Study of the effect of electron irradiation on a GaSe-SiO2 structure by spectroscopic methods

  • 1. Institute of Physics, Academy of Sciences of Azerbaijan, pr. Dzhavida 33, Baku, 370143 (Azerbaijan)
  • 2. Gyandzha State University, Gyandzha, 374700 (Azerbaijan)

Description

Auger electron spectroscopy and Raman spectroscopy were used to study a GaSe-SiO2 structure before and after irradiation with 4.0-MeV electrons at a dose of 3.0 x 1015 cm-2. It was shown that after the irradiation the thickness of the transition region in the GaSe-SiO2 structure decreases, while the oxide film becomes more homogenous. One of the possible causes of these changes may be radiation-stimulated gettering of Ga atoms by the GaSe-SiO2 interface that serves as a sink

Additional details

Identifiers

Publishing Information

Journal Title
Semiconductors
Journal Volume
36
Journal Issue
7
Journal Page Range
p. 805-807
ISSN
1063-7826
CODEN
SMICES

Optional Information

Notes
Translated from Fizika i Tekhnika Poluprovodnikov, ISSN 0015-3222, 36, 858-860 (No. 7, 2002); (c) 2002 MAIK ''Nauka / Interperiodica''.