Published December 2014
| Version v1
Journal article
Application of TXRF for burn leach test of TRISO coated UO2 particles
Creators
- 1. Bhabha Atomic Research Centre, Trombay, Mumbai (India). Fuel Chemistry Division
- 2. Bhabha Atomic Research Centre, Trombay, Mumbai (India). Materials Group
- 3. Bhabha Atomic Research Centre, Trombay, Mumbai (India). Product Development Division
Description
A Total Reflection X-Ray Fluorescence (TXRF) methodology, employing burn-leach test, was developed to assess the quality of SiC layer in tristructural isotropic (TRISO) coated UO2 particles prepared in BARC. The coated particles were heated at 1,123 K for about 96 h to constant weight. The calcined particles, thus obtained, were then heated in suprapure concentrated nitric acid. The supernatant was analysed for trace elements by TXRF. No uranium was detected in this supernatant solution. The study demonstrates the good quality of SiC layer and applicability of TXRF for burn leach test of TRISO coated UO2 particles prepared. (author)
Additional details
Publishing Information
- Journal Title
- Journal of Radioanalytical and Nuclear Chemistry
- Journal Volume
- 302
- Journal Issue
- 3
- Journal Page Range
- p. 1357-1361
- ISSN
- 0236-5731
- CODEN
- JRNCDM
Conference
- Title
- 5. Symposium on Nuclear Analytical Chemistry
- Acronym
- NAC-V
- Dates
- 20-24 Jan 2014
- Place
- Mumbai (India)
INIS
- Country of Publication
- Hungary
- Country of Input or Organization
- Hungary
- INIS RN
- 45113247
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CALCINATION; HEAT TREATMENTS; LAYERS; LEACHING; NITRIC ACID; OPTICAL REFLECTION; PARTICULATES; SILICON CARBIDES; TEMPERATURE RANGE 0400-1000 K; URANIUM OXIDES; X-RAY FLUORESCENCE ANALYSIS
- Descriptors DEC
- ACTINIDE COMPOUNDS; CARBIDES; CARBON COMPOUNDS; CHALCOGENIDES; CHEMICAL ANALYSIS; CHEMICAL REACTIONS; DECOMPOSITION; DISSOLUTION; HYDROGEN COMPOUNDS; INORGANIC ACIDS; INORGANIC COMPOUNDS; NITROGEN COMPOUNDS; NONDESTRUCTIVE ANALYSIS; OXIDES; OXYGEN COMPOUNDS; PARTICLES; PYROLYSIS; REFLECTION; SEPARATION PROCESSES; SILICON COMPOUNDS; TEMPERATURE RANGE; THERMOCHEMICAL PROCESSES; URANIUM COMPOUNDS; X-RAY EMISSION ANALYSIS
Optional Information
- Notes
- 8 refs.