System for deuterium-tritium mixture filling the working chamber of a dense plasma focus device

A gas-vacuum system designed for filling the gas-discharge chamber of a plasma focus device with equal-coaponent deuterium-tritium mixture is described. The system consists of a unit for gaseous mixture prepa ration and a unit for mixture absorption and device evacuation. The system provides the gaseous mixture purification of O2 and N2 impurities. Final tritium content in the gas-discharge chamber after tritium removal is not greater than 2x108 Bq/l. Tritium content in a sealed box in which the device is placed does not exceed 30 Bq/l that is less than limiting safe value. The conclusion is made that the described system design gives an opportunity to begin experimental studies at plasma focus devices with deuterium-tritium mixture