Published February 28, 2016 | Version v1
Journal article

Hydrogenation of CO2 to formic acid over a Cu-embedded graphene: A DFT study

  • 1. Center for Advanced Studies in Nanotechnology and Its Applications in Chemical, Food and Agricultural Industries and NANOTEC Center for Nanoscale Materials Design for Green Nanotechnology, Kasetsart University, Bangkok 10900 (Thailand)
  • 2. Department of Chemistry, Faculty of Science, Kasetsart University, Bangkok 10900 (Thailand)
  • 3. Department of Materials Science and Engineering, Vidyasirimedhi Institute of Science and Technology, Rayong 21210 (Thailand)

Description

Graphical abstract: - Highlights: • The H2 molecule binds much more strongly on the Cu/dG than the CO2 molecule. • H2 dissociation occurs readily on the supported Cu atom. • The CO2 conversion is significantly promoted by the Cu-H on the graphene. - Abstract: DFT calculations were used to investigate the properties of the atomic copper embedded in the surface of graphene (Cu/dG) and the catalytic reaction pathway for the CO2 hydrogenation to formic acid (FA). The Cu/dG was active for the adsorption of the hydrogen molecule (H2), and provided a reaction site for the heterolytic cleavage of H2, leading to the formation of Cu-H deposited on a singly hydrogenated vacancy graphene (Cu-H/H-dG). The protonation of CO2 takes place facilely over the generated metal-hydride species (Cu-H). Under the dilution of H2, the catalytic process would be hampered by the formation of copper-formate deposited on the H-dG due mainly to the very high energy demand for the transformation of the copper-formate to FA through the protonation from the H-dG. It was further found that the presence of H2 in the system plays a significant role in producing the FA on the Cu/dG catalyst. The copper-formate species can be converted into formic acid via the heterolytic cleavage of the second hydrogen molecule, yielding the FA and Cu-H species.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2015.12.117

Additional details

Identifiers

DOI
10.1016/j.apsusc.2015.12.117;
PII
S0169-4332(15)03122-0;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
364
Journal Page Range
p. 241-248
ISSN
0169-4332
CODEN
ASUSEE

Optional Information

Copyright
Copyright (c) 2015 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.