Published March 2001 | Version v1
Journal article

Suppression of net erosion in the DIII-D divertor with detached plasmas

Description

The ability to withstand disruptions makes carbon-based materials attractive for use as plasma-facing components in divertors. However, such materials suffer high erosion rates during attached plasma operation which, in high power long pulse machines, would give short component lifetimes and high tritium inventories. We present the results from recent experiments in DIII-D, in which the divertor materials evaluation system (DiMES) was used to examine erosion and deposition during short exposures to well-defined plasma conditions. These studies show that during operation with detached plasmas, produced by gas injection, net erosion is suppressed everywhere in the divertor. Net deposition of carbon with deuterium was observed at the inner and outer strike points and in the private flux region between strike points. For these low temperature plasmas (Te<2 eV), physical sputtering is eliminated. These results show that with detached plasmas, the location of carbon net erosion and the carbon impurity source, probably lies outside the divertor. Physical or chemical sputtering by charge-exchange neutrals or ions in the main plasma chamber is a probable source of carbon under these plasma conditions

Additional details

Identifiers

PII
S002231150000636X;

Publishing Information

Journal Title
Journal of Nuclear Materials
Journal Volume
290-293
Journal Issue
2-3
Journal Page Range
p. 346-351
ISSN
0022-3115
CODEN
JNUMAM

INIS

Country of Publication
Netherlands
Country of Input or Organization
Ukraine
INIS RN
33048837
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
CARBON; DEPOSITION; DIVERTORS; DOUBLET-3 DEVICE; EROSION; PLASMA; SPUTTERING; THERMONUCLEAR REACTOR MATERIALS
Descriptors DEC
CLOSED PLASMA DEVICES; ELEMENTS; MATERIALS; NONMETALS; THERMONUCLEAR DEVICES; TOKAMAK DEVICES

Optional Information

Copyright
Copyright (c) 2001 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.