Published May 1995
| Version v1
Journal article
A short review of ionized cluster beam technology
Description
Surface processing technology by ionized cluster beams (ICB) having energies of a few keV is reviewed in comparison with the one of atomic and molecular ion beams. It has been demonstrated that the ICB technique can be applied to a wide variety of surface processes for industrial applications. Since ion-surface interactions of cluster ions are quite different than those of monomer ions, new opportunities for surface processing exist, such as deposition, surface cleaning, low damage sputtering and shallow implantation. (orig.)
Additional details
Publishing Information
- Journal Title
- Nuclear Instruments and Methods in Physics Research. Section B, Beam Interactions with Materials and Atoms
- Journal Volume
- 99
- Journal Issue
- 1-4
- Journal Page Range
- p. 240-243.
- ISSN
- 0168-583X
- CODEN
- NIMBEU
Conference
- Title
- 13. international conference on the application of accelerators in research and industry - topical conference of the Division of Nuclear Physics (DNP) of the American Physical Society (APS).
- Dates
- 7-10 Nov 1994.
- Place
- Denton, TX (United States).
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- Netherlands
- INIS RN
- 27018443
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S36: MATERIALS SCIENCE; S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CLUSTER BEAMS; ION BEAMS; ION IMPLANTATION; KEV RANGE 01-10; MOLECULAR BEAMS; MOLECULAR IONS; REVIEWS; SPUTTERING; SURFACE CLEANING; SURFACE PROPERTIES; SURFACES; THIN FILMS
- Descriptors DEC
- BEAMS; CHARGED PARTICLES; CLEANING; DOCUMENT TYPES; ENERGY RANGE; FILMS; IONS; KEV RANGE; SURFACE FINISHING