Defect control in room temperature deposited cadmium sulfide thin films by pulsed laser deposition
Creators
- 1. Department of Materials Science and Engineering, University of Texas at Dallas, Richardson, TX, 75080 (United States)
- 2. Centro de Investigación en Materiales Avanzados, Monterrey, Nuevo Leon, 66600, México (Mexico)
- 3. Instituto de Física, Universidade Federal do Rio Grande do Sul, Porto Alegre, 91509-900 (Brazil)
Description
The control of defects in cadmium sulfide thin films and its impact on the resulting CdS optical and electrical characteristics are studied. Sulfur vacancies and cadmium interstitial concentrations in the CdS films are controlled using the ambient pressure during pulsed laser deposition. CdS film resistivities ranging from 10−1 to 104 Ω-cm are achieved. Hall Effect measurements show that the carrier concentration ranges from 1019 to 1013 cm−3 and is responsible for the observed resistivity variation. Hall mobility varies from 2 to 12 cm2/V-s for the same pressure regime. Although the energy bandgap remains unaffected (∼ 2.42 eV), the optical transmittance is reduced due to the increase of defects in the CdS films. Rutherford back scattering spectroscopy shows the dependence of the CdS films stoichiometry with deposition pressure. The presence of CdS defects is attributed to more energetic species reaching the substrate, inducing surface damage in the CdS films during pulsed laser deposition. - Highlights: • CdS thin films deposited by pulsed laser deposition at room temperature. • The optical, electrical and structural properties were evaluated. • Carrier concentration ranged from 1019 to 1013 cm−3. • The chemical composition was studied by Rutherford back scattering. • The density of sulfur vacancies and cadmium interstitial was varied
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2013.10.168Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2013.10.168;
- PII
- S0040-6090(13)01801-4;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 550
- Journal Page Range
- p. 665-668
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46128655
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- BACKSCATTERING; CADMIUM SULFIDES; CARRIER MOBILITY; CHEMICAL COMPOSITION; CONCENTRATION RATIO; ELECTRIC CONDUCTIVITY; ENERGY BEAM DEPOSITION; ENERGY GAP; HALL EFFECT; LASER RADIATION; PULSED IRRADIATION; SUBSTRATES; SURFACES; TEMPERATURE RANGE 0273-0400 K; THIN FILMS; VACANCIES
- Descriptors DEC
- CADMIUM COMPOUNDS; CHALCOGENIDES; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; DEPOSITION; DIMENSIONLESS NUMBERS; ELECTRICAL PROPERTIES; ELECTROMAGNETIC RADIATION; FILMS; INORGANIC PHOSPHORS; IRRADIATION; MOBILITY; PHOSPHORS; PHYSICAL PROPERTIES; POINT DEFECTS; RADIATIONS; SCATTERING; SULFIDES; SULFUR COMPOUNDS; SURFACE COATING; TEMPERATURE RANGE
Optional Information
- Copyright
- Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.