Published June 7, 2006 | Version v1
Journal article

Methane reformation using plasma: an initial study

  • 1. Department of Physical Chemistry, Eoetvoes Lorand University (ELTE) H-1117 Budapest, Pazmany Peter setany 1/A (Hungary)
  • 2. IRIS, Faculty of Engineering and Industrial Sciences, Swinburne University of Technology, PO Box 218 Hawthorn, Victoria 3122 (Australia)

Description

An initial study of the reformation of methane using a microwave induced plasma and quench has been carried out. Methane/argon mixtures at atmospheric pressure were treated experimentally. The study encompasses both experiments and modelling, to measure and predict the maximum throughput and final product mix from the reactor. Both experiments showed and theory predicted that the most important gas phase product was acetylene; however soot formation was significant. The modelling comprised both equilibrium thermodynamic and kinetic modelling. The equilibrium modelling was used to predict the throughput of the plasma reactor, because at the plasma temperature, achieved by microwaves at atmospheric pressure, equilibrium was achieved well before the plasma had time to flow through the plasma generating region of the reactor. Chemical kinetic modelling was used to predict the final products emerging from the quench and indicated that for the quench rates used in practice (about 10 000 K s-1), gas phase reactions are too slow to reach equilibrium below about 2000 K

Availability note (English)

Available online at http://stacks.iop.org/0022-3727/39/2391/d6_11_013.pdf or at the Web site for the Journal of Physics. D, Applied Physics (ISSN 1361-6463) http://www.iop.org/

Additional details

Publishing Information

Journal Title
Journal of Physics. D, Applied Physics
Journal Volume
39
Journal Issue
11
Journal Page Range
p. 2391-2400
ISSN
0022-3727
CODEN
JPAPBE

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
38001370
Subject category
S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
ACETYLENE; ARGON; ATMOSPHERIC PRESSURE; ELECTRON TEMPERATURE; EQUILIBRIUM; ION TEMPERATURE; METHANE; MICROWAVE RADIATION; MIXTURES; PLASMA
Descriptors DEC
ALKANES; ALKYNES; DISPERSIONS; ELECTROMAGNETIC RADIATION; ELEMENTS; FLUIDS; GASES; HYDROCARBONS; NONMETALS; ORGANIC COMPOUNDS; RADIATIONS; RARE GASES