Published October 1, 2007 | Version v1
Journal article

Photoluminescence degradation in GaN induced by light enhanced surface oxidation

  • 1. State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, P.O. Box 912, Beijing 100083 (China)

Description

The exponential degradation of the photoluminescence (PL) intensity at the near-band-gap was observed in heavily doped or low-quality GaN with pristine surface under continuous helium-cadmium laser excitation. In doped GaN samples, the degradation speed increased with doping concentration. The oxidation of the surface with laser irradiation was confirmed by x-ray photoemission spectroscopy measurements. The oxidation process introduced many oxygen impurities and made an increase of the surface energy band bending implied by the shift of Ga 3d binding energy. The reason for PL degradation may lie in that these defect states act as nonradiative centers and/or the increase of the surface barrier height reduces the probability of radiative recombination

Additional details

Identifiers

Publishing Information

Journal Title
Journal of Applied Physics
Journal Volume
102
Journal Issue
7
Journal Page Range
p. 076112-076112.3
ISSN
0021-8979
CODEN
JAPIAU

Optional Information

Notes
(c) 2007 American Institute of Physics