Published February 1982
| Version v1
Journal article
Void growth in LiF thin films under electron irradiation
Description
no abstract available
Additional details
Additional titles
- Original title (Russian)
- Рост пор в тонких пленках LiF под электронным облушением
Publishing Information
- Journal Title
- Fiz. Tverd. Tela
- Journal Volume
- 24
- Journal Issue
- 2
- Series
- Fiz. Tverd. Tela.
- Journal Page Range
- 605-607
- ISSN
- 0367-3294
INIS
- Country of Publication
- Russian Federation
- Country of Input or Organization
- USSR
- INIS RN
- 14717069
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- No Abstract
- Descriptors DEI
- CRYSTAL DEFECTS; ELECTRON BEAMS; FILMS; LITHIUM FLUORIDES; PHYSICAL RADIATION EFFECTS; VOIDS
- Descriptors DEC
- ALKALI METAL COMPOUNDS; BEAMS; CRYSTAL STRUCTURE; FLUORIDES; FLUORINE COMPOUNDS; HALIDES; HALOGEN COMPOUNDS; LEPTON BEAMS; LITHIUM COMPOUNDS; LITHIUM HALIDES; PARTICLE BEAMS; RADIATION EFFECTS
Optional Information
- Notes
- Short note. For English translation see the journal Soviet Physics - Solid State (USA).