Published September 2018 | Version v1
Journal article

Lateral position correction in ptychography using the gradient of intensity patterns

  • 1. Optics Research Group, Department of Imaging Physics, Delft University of Technology, Lorentzweg 1, Delft, 2628CJ (Netherlands)

Description

Highlights: • New method to correct the probe position in ptychography is proposed. • This method can correct the probe position with sub-pixel accuracy. • Less computationally expensive than other existing methods. • It is straightforward to implement. • Results with visible light experimental data are shown. - Abstract: Ptychography, a form of Coherent Diffractive Imaging, is used with short wavelengths (e.g. X-rays, electron beams) to achieve high-resolution image reconstructions. One of the limiting factors for the reconstruction quality is the accurate knowledge of the illumination probe positions. Recently, many advances have been made to relax the requirement for the probe positions accuracy. Here, we analyse and demonstrate a straightforward approach that can be used to correct the probe positions with sub-pixel accuracy. Simulations and experimental results with visible light are presented in this work.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.ultramic.2018.04.004

Additional details

Identifiers

DOI
10.1016/j.ultramic.2018.04.004;
PII
S0304399117303273;

Publishing Information

Journal Title
Ultramicroscopy (Amsterdam)
Journal Volume
192
Journal Page Range
p. 29-36
ISSN
0304-3991
CODEN
ULTRD6

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
50052267
Subject category
S77: NANOSCIENCE AND NANOTECHNOLOGY;
Descriptors DEI
CORRECTIONS; ELECTRON BEAMS; IMAGE PROCESSING; PROBES; RESOLUTION; SIMULATION; VISIBLE RADIATION; WAVELENGTHS; X RADIATION
Descriptors DEC
BEAMS; ELECTROMAGNETIC RADIATION; IONIZING RADIATIONS; LEPTON BEAMS; PARTICLE BEAMS; PROCESSING; RADIATIONS

Optional Information

Copyright
Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.