Published September 2015 | Version v1
Journal article

Fabrication and optimization of 1.55-μm InGaAsP/InP high-power semiconductor diode laser

  • 1. Key Laboratory of Semiconductors Materials, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083 (China)

Description

A comprehensive design optimization of 1.55-μm high power InGaAsP/InP board area lasers is performed aiming at increasing the internal quantum efficiency (ηi) while maintaining the low internal loss (αi) of the device, thereby achieving high power operation. Four different waveguide structures of broad area lasers were fabricated and characterized in depth. Through theoretical analysis and experiment verifications, we show that laser structures with stepped waveguide and thin upper separate confinement layer will result in high ηi and overall slope efficiency. A continuous wave (CW) single side output power of 160 mW was obtained for an uncoated laser with a 50-μm active area width and 1 mm cavity length. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1674-4926/36/9/094010

Additional details

Publishing Information

Journal Title
Journal of Semiconductors
Journal Volume
36
Journal Issue
9
Journal Page Range
[4 p.]
ISSN
1674-4926

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
47089267
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
DESIGN; FABRICATION; INDIUM PHOSPHIDES; LASERS; QUANTUM EFFICIENCY; SEMICONDUCTOR DIODES; WAVEGUIDES
Descriptors DEC
EFFICIENCY; INDIUM COMPOUNDS; PHOSPHIDES; PHOSPHORUS COMPOUNDS; PNICTIDES; SEMICONDUCTOR DEVICES