Published January 2022 | Version v1
Journal article

Ternary transition metal chalcogenide Nb2Pd3Se8. A new candidate of 1D van der Waals materials for field-effect transistors

  • 1. School of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, 16419 (Korea, Republic of)
  • 2. SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon, 16419 (Korea, Republic of)
  • 3. Department of Chemistry, Sungkyunkwan University, Suwon, 16419 (Korea, Republic of)
  • 4. Department of Materials Science and Engineering & Department of Energy Systems Research, Ajou University, Suwon, 16499 (Korea, Republic of)
  • 5. Institute of Quantum Biophysics, Sungkyunkwan University, Suwon, 16419 (Korea, Republic of)

Description

In this work, high-quality 1D van der Waals (vdW) Nb2Pd3Se8 is synthesized, showing an excellent scalability from bulk to single-ribbon due to weakly bonded repeating unit ribbons. The calculation of electronic band structures confirmed that this novel Nb2Pd3Se8 is a semiconducting material, displaying indirect-to-direct bandgap transition with decreasing the number of unit-ribbons from bulk to single. Field effect transistors (FETs) fabricated on the mechanically exfoliated Nb2Pd3Se8 nanowires exhibit n-type transport characteristics at room temperature, resulting in the values for the electron mobility and Ion/Ioff ratio of 31 cm2 V1 s1 and 104, respectively. Through transport measurements at various temperatures from room temperature down to 90 K, it is confirmed that Nb2Pd3Se8 FETs can achieve negligible Schottky barrier height (SBH) for the Au contacts at the temperature range, displaying clear ohmic contact characteristics. Furthermore, top-gated FETs fabricated with the Al2O3 dielectric layer are studied simultaneously with back-gated FETs. (© 2021 Wiley‐VCH GmbH)

Availability note (English)

Available from: http://dx.doi.org/10.1002/adfm.202108104

Additional details

Identifiers

Publishing Information

Journal Title
Advanced Functional Materials (Internet)
Journal Volume
32
Journal Issue
4
Journal Page Range
p. 1-11
ISSN
1616-3028

Optional Information

Notes
AID: 2108104