Published July 8, 2011
| Version v1
Journal article
Epitaxial Interfaces between Crystallographically Mismatched Materials
- 1. Center for Computational Materials Science, Naval Research Laboratory, Washington, D.C. 20375 (United States)
- 2. Paul-Drude-Institut fuer Festkoerperelektronik, Hausvogteiplatz 5-7, 10117 Berlin (Germany)
Description
We report an unexpected mechanism by which an epitaxial interface can form between materials having strongly mismatched lattice constants. A simple model is proposed in which one material tilts out of the interface plane to create a coincidence-site lattice that balances two competing geometrical criteria--low residual strain and short coincidence-lattice period. We apply this model, along with complementary first-principles total-energy calculations, to the interface formed by molecular-beam epitaxy of cubic Fe on hexagonal GaN and find excellent agreement between theory and experiment.
Additional details
Identifiers
- DOI
- 10.1103/PhysRevLett.107.026102;
- arXiv
- arXiv:1106.2955v1;
Publishing Information
- Journal Title
- Physical Review Letters
- Journal Volume
- 107
- Journal Issue
- 2
- Journal Page Range
- p. 026102-026102.4
- ISSN
- 0031-9007
- CODEN
- PRLTAO
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 43083571
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- CRYSTALLOGRAPHY; GALLIUM NITRIDES; INTERFACES; IRON; LATTICE PARAMETERS; MOLECULAR BEAM EPITAXY
- Descriptors DEC
- CRYSTAL GROWTH METHODS; ELEMENTS; EPITAXY; GALLIUM COMPOUNDS; METALS; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES; TRANSITION ELEMENTS
Optional Information
- Notes
- (c) 2011 American Institute of Physics