Published July 8, 2011 | Version v1
Journal article

Epitaxial Interfaces between Crystallographically Mismatched Materials

  • 1. Center for Computational Materials Science, Naval Research Laboratory, Washington, D.C. 20375 (United States)
  • 2. Paul-Drude-Institut fuer Festkoerperelektronik, Hausvogteiplatz 5-7, 10117 Berlin (Germany)

Description

We report an unexpected mechanism by which an epitaxial interface can form between materials having strongly mismatched lattice constants. A simple model is proposed in which one material tilts out of the interface plane to create a coincidence-site lattice that balances two competing geometrical criteria--low residual strain and short coincidence-lattice period. We apply this model, along with complementary first-principles total-energy calculations, to the interface formed by molecular-beam epitaxy of cubic Fe on hexagonal GaN and find excellent agreement between theory and experiment.

Additional details

Publishing Information

Journal Title
Physical Review Letters
Journal Volume
107
Journal Issue
2
Journal Page Range
p. 026102-026102.4
ISSN
0031-9007
CODEN
PRLTAO

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
43083571
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
CRYSTALLOGRAPHY; GALLIUM NITRIDES; INTERFACES; IRON; LATTICE PARAMETERS; MOLECULAR BEAM EPITAXY
Descriptors DEC
CRYSTAL GROWTH METHODS; ELEMENTS; EPITAXY; GALLIUM COMPOUNDS; METALS; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES; TRANSITION ELEMENTS

Optional Information

Notes
(c) 2011 American Institute of Physics