Published January 2004
| Version v1
Journal article
Study of plasma processes in afterglow by means of electron spin resonance
Creators
- 1. Department of Physical Electronics, Faculty of Science, Masaryk University Kotlarska 2, CZ-61137 Brno (Czech Republic)
Description
This contribution is intended to summarize in a practically useful form the basic information about the detection of the gas phase atoms and free radicals by electron spin resonance spectroscopy (ESR) in gas discharge afterglow and in remote plasma reactors. This paper shows how ESR could by effectively used for the monitoring of relative or absolute concentrations of gas phase H, O, N atoms during the volume plasma chemical and wall recombination processes (Authors)
Additional details
Publishing Information
- Journal Title
- Acta Physica Slovaca
- Journal Volume
- 54
- Journal Issue
- 2
- Journal Page Range
- p. 163-167
- ISSN
- 0323-0465
- CODEN
- APSVCO
Conference
- Title
- 14. Symposium on Application of Plasma Processes
- Dates
- Jan 2003
- Place
- Liptovsky Mikulas (Slovakia)
INIS
- Country of Publication
- Slovakia
- Country of Input or Organization
- Slovakia
- INIS RN
- 36001046
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference, Numerical Data
- Descriptors DEI
- AFTERGLOW; CHEMICAL VAPOR DEPOSITION; ELECTRON DENSITY; ELECTRON SPIN RESONANCE; ENERGY LEVELS; LOSSES; MAGNETIC DIPOLES; MAGNETIC FIELDS; NITROGEN ISOTOPES; QUANTUM NUMBERS; RECOMBINATION; SELECTION RULES; THEORETICAL DATA; ZEEMAN EFFECT
- Descriptors DEC
- CHEMICAL COATING; DATA; DEPOSITION; DIPOLES; INFORMATION; ISOTOPES; MAGNETIC RESONANCE; MULTIPOLES; NUMERICAL DATA; RESONANCE; SURFACE COATING
Optional Information
- Notes
- 9 refs., 4 figs.