Published July 18, 2005 | Version v1
Journal article

Evidence of interface-induced persistent photoconductivity in InP/In0.53Ga0.47As/InP double heterostructures grown by molecular-beam epitaxy

  • 1. Department of Electrical and Computer Engineering, Ohio State University, Columbus, Ohio 43210 (United States)
  • 2. National Renewable Energy Laboratory, Golden, Colorado 80401 (United States)

Description

The impact of interface switching sequences on interface quality and minority carrier recombination in In0.53Ga0.47As/InP double heterostructure (DH) grown by solid-source molecular-beam epitaxy (MBE) was studied. As2 exposure at the lower In0.53Ga0.47As/InP interface prior to In0.53Ga0.47As growth was found to cause enhanced As diffusion into the underlying InP that correlates with steadily increased photoconductive decay (PCD) lifetimes beyond the theoretical radiative and Auger limit. Low-temperature PCD measurements reveal that a persistent photoconductivity (PPC) process is responsible for the high 'apparent' lifetimes. The PPC effect increases monotonically with As2 exposure on the InP surface, implying the involvement of interfacial defects in the carrier recombination dynamics of In0.53Ga0.47As/InP DHs grown by MBE

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
87
Journal Issue
3
Journal Page Range
p. 032106-032106.3
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
(c) 2005 American Institute of Physics