Published December 2012 | Version v1
Journal article

Electron attachment rate constant measurement by photoemission electron attachment ion mobility spectrometry (PE-EA-IMS)

  • 1. Laboratory of Environmental Spectroscopy, Anhui Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Hefei 230031 (China)
  • 2. Center of Medical Physics and Technology, Hefei Institutes of Physical Science, Chinese Academy of Sciences, Hefei 230031 (China)
  • 3. School of Sciences, Anhui Agricultural University, Hefei 230036 (China)

Description

Photoemission electron attachment ion mobility spectrometry (PE-EA-IMS), with a source of photoelectrons induced by vacuum ultraviolet radiation on a metal surface, has been developed to study electron attachment reaction at atmospheric pressure using nitrogen as the buffer gas. Based on the negative ion mobility spectra, the rate constants for electron attachment to tetrachloromethane and chloroform were measured at ambient temperature as a function of the average electron energy in the range from 0.29 to 0.96 eV. The experimental results are in good agreement with the data reported in the literature. - Highlights: ► Photoemission electron attachment ion mobility spectrometry (PE-EA-IMS) was developed to study electron attachment reaction. ► The rate constants of electron attachment to CCl4 and CHCl3 were determined. ► The present experimental results are in good agreement with the previously reported data.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.radphyschem.2012.07.005

Additional details

Identifiers

DOI
10.1016/j.radphyschem.2012.07.005;
PII
S0969-806X(12)00350-7;

Publishing Information

Journal Title
Radiation Physics and Chemistry (1993)
Journal Volume
81
Journal Issue
12
Journal Page Range
p. 1869-1873
ISSN
0969-806X
CODEN
RPCHDM

Optional Information

Copyright
Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.