Hard X-ray synchrotron light source for industrial and materials research applications

The requirements for industrial production or for an industry-related analytical environment is demonstrated for the case of the proposed hard X-ray synchrotron light source. The source is intended to provide radiation mainly for deep X-ray lithography as part of the LIGA-process in microfabrication, and for analytical and diagnostic purposes in materials research and microtechnology. It offers up to 48 bending magnet beamlines with a characteristic wavelength of 2 A. An electron energy of 2.5 GeV and normal conducting magnets will be used. A FODO lattice with a beam emittance of 3x10-7 m rad and four dispersion-free straight sections to accommodate insertion devices, injection elements and RF structures has been designed. (R.P.) 5 refs.; 4 figs.; 1 tab