Surface morphology created by nanosecond laser annealing of amorphised Si layer-Investigations by complementary methods

The formation of morphological structures on an amorphised Si surface by annealing with nanosecond laser pulse is studied. The resulting structures are investigated by complementary methods: interference microscopy with Nomarski contrast, atomic force microscopy and high-resolution electron microscopy. The evolution of the misfit morphological structures for variable fluence of the laser beam and for variable area of the focused laser beam is shown.