Published October 27, 2014 | Version v1
Journal article

Assessment of surface roughness of substrates subjected to plasma-chemical etching

  • 1. Department of Nanoengineering, Samara State Aerospace University National Research University, 34 Moskovskoye shosse, Samara 443086 (Russian Federation)

Description

The model based on fractional Brownian surface for substrate surface roughness assessment subjected to plasma-chemical etching is proposed

Availability note (English)

Available from http://dx.doi.org/10.1088/1742-6596/541/1/012100

Additional details

Publishing Information

Journal Title
Journal of Physics. Conference Series (Online)
Journal Volume
541
Journal Issue
1
Journal Page Range
[4 p.]
ISSN
1742-6596

Conference

Title
1. international school and conference on optoelectronics, photonics, engineering and nanostructures
Acronym
OPEN 2014
Dates
25-27 Mar 2014
Place
St Petersburg (Russian Federation)

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
46082564
Subject category
S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ETCHING; MATHEMATICAL MODELS; PLASMA; ROUGHNESS; SUBSTRATES; SURFACES
Descriptors DEC
SURFACE FINISHING; SURFACE PROPERTIES