Published October 27, 2014
| Version v1
Journal article
Assessment of surface roughness of substrates subjected to plasma-chemical etching
Creators
- 1. Department of Nanoengineering, Samara State Aerospace University National Research University, 34 Moskovskoye shosse, Samara 443086 (Russian Federation)
Description
The model based on fractional Brownian surface for substrate surface roughness assessment subjected to plasma-chemical etching is proposed
Availability note (English)
Available from http://dx.doi.org/10.1088/1742-6596/541/1/012100Additional details
Identifiers
Publishing Information
- Journal Title
- Journal of Physics. Conference Series (Online)
- Journal Volume
- 541
- Journal Issue
- 1
- Journal Page Range
- [4 p.]
- ISSN
- 1742-6596
Conference
- Title
- 1. international school and conference on optoelectronics, photonics, engineering and nanostructures
- Acronym
- OPEN 2014
- Dates
- 25-27 Mar 2014
- Place
- St Petersburg (Russian Federation)
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46082564
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ETCHING; MATHEMATICAL MODELS; PLASMA; ROUGHNESS; SUBSTRATES; SURFACES
- Descriptors DEC
- SURFACE FINISHING; SURFACE PROPERTIES