Published December 1, 1993 | Version v1
Journal article

Synchrotron radiation sources and condensers for projection x-ray lithography

  • 1. National Synchrotron Light Source, Brookhaven National Laboratory, Upton, New York 11973 (United States)
  • 2. AT ampersand T Bell Laboratories at 600 Mountain Avenue, Murray Hill, New Jersey 07974 (United States)
  • 3. AT ampersand T Bell Laboratories at 510E Brookhaven Laboratory, Upton, New York 11973 (United States)
  • 4. AT ampersand T Bell Laboratories at Crawfords Corner Road, Holmdel, New Jersey 07733 (United States)

Description

The design requirements for a compact electron storage ring that could be used as a soft-x-ray source for projection lithography are discussed. The design concepts of the x-ray optics that are required for collecting and conditioning the radiation in divergence, uniformity, and direction to illuminate the mask correctly and the particular x-ray projection camera used are discussed. Preliminary designs for an entire soft-x-ray projection lithography system that uses an electron storage ring as a soft-x-ray source are presented. It is shown that, by combining the existing technology of storage rings with large collection angle condensers, a powerful and reliable source of 130-A photons for production line projection x-ray lithography is possible

Additional details

Publishing Information

Journal Title
Applied Optics
Journal Volume
32
Journal Issue
34
Journal Page Range
p. 6920-6929.
ISSN
0003-6935
CODEN
APOPAI