Oxidation of (110) and (100) faces of molybdenum monocrystals at low temperatures

Oxides films formed at 30 and 460 deg C on the surface of molybdenum monocrystal faces were studied. Thickness of films formed at approximately 30 deg was determined by 3He ions accelerated of up to 7 MeV. A technique of activation analysis with charged particles corresponds to an averaged value including oxygen of a surgace layer. The activation analysis with accelerated 3He ions envisages after the activation process the removal of the surface layer contaminated with oxygen. As a results of molybdenum oxidation at a low temperature only oxides of the MoO3 type, which density constitutes approximately 4.6 g/cm3, form. Therefore mass and thickness of oxide layer can be determined during the process conducting in a closed volume. According to the results obtained th.in oxide films on the surface molybdenum are not a considerable obstacle for oxygen diffusion through an oxide layer. therefore the oxidation process is determined with substrate properties. The most stable oxide layers are observed on a densepacked face (110) of a monocrystal