Published 1976 | Version v1
Book

Theoretical and practical considerations affecting high resolution HVEM of organic materials

Creators

  • 1. California Univ., Berkeley (USA). Donner Lab.

Description

Radiation damage, which results from inelastic electron scattering and ionization, is perhaps the most important obstacle at the present time for attaining high resolution electron micrographs with biological specimens. The choice of accelerating voltage influences the radiation damage problem in a number of different ways. The best known effect is that the specimen lifetime increases with increasing voltage. The voltage dependence of the image detector sensitivity in also an easily recognized problem. Perhaps the most important factor is the voltage dependence of image contrast. The voltage dependence of contrast is also, by far, the most complicated matter to consider since contrast considerations depend also upon the specimen thickness, the type of object, the optical conditions employed, the instrumental resolving power, and the question of whether the image can be interpreted in terms of the original object structure

Additional details

Additional titles

Original title (no language)
Microscopie electronique a haute tension. 4. Congres international. Toulouse, 1-4 septembre 1975.

Publishing Information

Publisher
Societe Francaise de Microscopie Electronique.
Imprint Place
Paris
Imprint Title
High voltage electron microscopy. 4. International congress. Toulouse, 1-4 September 1975
Imprint Pagination
p. 165-170.

Conference

Title
4. International congress on high voltage electron microscopy.
Dates
1 Sep 1975.
Place
Toulouse, France.

INIS

Optional Information

Notes
Imprint:Microscopie electronique a haute tension. 4. Congres international. Toulouse, 1-4 septembre 1975.