Published July 2009 | Version v1
Journal article

High-performance InGaP/GaAs pnp δ-doped heterojunction bipolar transistor

  • 1. National Kaohsiung Normal University, Department of Electronic Engineering (China)
  • 2. National Taiwan Ocean University, Department of Electrical Engineering (China)
  • 3. Air Force Academy, Department of Electronic Engineering (China)

Description

In this article, a novel InGaP/GaAs pnp δ-doped heterojunction bipolar transistor is first demonstrated. Though the valence band discontinuity at InGaP/GaAs heterojunction is relatively large, the addition of a δ-doped sheet between two spacer layers at the emitter-base (E-B) junction effectively eliminates the potential spike and increases the confined barrier for electrons, simultaneously. Experimentally, a high current gain of 25 and a relatively low E-B offset voltage of 60 mV are achieved. The offset voltage is much smaller than the conventional InGaP/GaAs pnp HBT. The proposed device could be used for linear amplifiers and low-power complementary integrated circuit applications.

Additional details

Identifiers

Publishing Information

Journal Title
Semiconductors
Journal Volume
43
Journal Issue
7
Journal Page Range
p. 939-942
ISSN
1063-7826
CODEN
SMICES

Optional Information

Copyright
Copyright (c) 2009 Pleiades Publishing, Ltd.