Published October 2018 | Version v1
Journal article

High purity and crystalline thin films of methylammonium lead iodide perovskites by a vapor deposition approach

  • 1. LEPABE – Laboratory for Process Engineering, Environment, Biotechnology and Energy, University of Porto, Rua Dr. Roberto Frias, P-4200-465 Porto (Portugal)
  • 2. CIQUP – Centro de Investigação em Química da Universidade do Porto, Department of Chemistry and Biochemistry, University of Porto, Rua do Campo Alegre, 687, P-4169-007 Porto (Portugal)
  • 3. IFIMUP and IN – Institute of Nanoscience and Nanotechnology, Department of Physics and Astronomy, University of Porto, Rua do Campo Alegre, 687, P-4169-007 Porto (Portugal)

Description

Highlights: • High-purity perovskite films can be prepared by a vapor deposition approach. • Thin film deposition is controlled by the molar flow rate of perovskite sources. • Stoichiometric flow rates of both reactants are achieved by using Knudsen cells. • Compact, uniform, stable and crystalline perovskite thin films were produced. - Abstract: A procedure for the physical vapor deposition (PVD), in high-vacuum conditions, for high purity and crystalline methylammonium lead halide perovskite thin films is described. This procedure and methodology can be used to fabricate high-performance hybrid organic-inorganic materials that have recently emerged as the next-generation photovoltaic technology. PVD of methylammonium iodide and lead iodide to produce lead halide perovskite thin films was optimized according to the equilibrium vapor pressures of corresponding precursors evaporated from Knudsen effusion cells. Optical properties of perovskite thin films were characterized by UV-Vis-NIR and fluorescence spectroscopy. The high crystallinity of vapor-deposited thin films on glass, indium tin oxide, fluorine-doped tin oxide, and TiO2 surfaces was proved by scanning electron microscopy and X-ray diffraction. This vapor deposition approach leads to the production of very pure, crystalline and high stable perovskite thin films.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.tsf.2018.08.026

Additional details

Identifiers

DOI
10.1016/j.tsf.2018.08.026;
PII
S0040609018305571;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
664
Journal Page Range
p. 12-18
ISSN
0040-6090
CODEN
THSFAP

Optional Information

Copyright
Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.