High purity and crystalline thin films of methylammonium lead iodide perovskites by a vapor deposition approach
Creators
- 1. LEPABE – Laboratory for Process Engineering, Environment, Biotechnology and Energy, University of Porto, Rua Dr. Roberto Frias, P-4200-465 Porto (Portugal)
- 2. CIQUP – Centro de Investigação em Química da Universidade do Porto, Department of Chemistry and Biochemistry, University of Porto, Rua do Campo Alegre, 687, P-4169-007 Porto (Portugal)
- 3. IFIMUP and IN – Institute of Nanoscience and Nanotechnology, Department of Physics and Astronomy, University of Porto, Rua do Campo Alegre, 687, P-4169-007 Porto (Portugal)
Description
Highlights: • High-purity perovskite films can be prepared by a vapor deposition approach. • Thin film deposition is controlled by the molar flow rate of perovskite sources. • Stoichiometric flow rates of both reactants are achieved by using Knudsen cells. • Compact, uniform, stable and crystalline perovskite thin films were produced. - Abstract: A procedure for the physical vapor deposition (PVD), in high-vacuum conditions, for high purity and crystalline methylammonium lead halide perovskite thin films is described. This procedure and methodology can be used to fabricate high-performance hybrid organic-inorganic materials that have recently emerged as the next-generation photovoltaic technology. PVD of methylammonium iodide and lead iodide to produce lead halide perovskite thin films was optimized according to the equilibrium vapor pressures of corresponding precursors evaporated from Knudsen effusion cells. Optical properties of perovskite thin films were characterized by UV-Vis-NIR and fluorescence spectroscopy. The high crystallinity of vapor-deposited thin films on glass, indium tin oxide, fluorine-doped tin oxide, and TiO2 surfaces was proved by scanning electron microscopy and X-ray diffraction. This vapor deposition approach leads to the production of very pure, crystalline and high stable perovskite thin films.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2018.08.026Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2018.08.026;
- PII
- S0040609018305571;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 664
- Journal Page Range
- p. 12-18
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 50038156
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- DOPED MATERIALS; FLUORESCENCE SPECTROSCOPY; FLUORINE ADDITIONS; GLASS; KNUDSEN FLOW; LEAD IODIDES; OPTICAL PROPERTIES; PEROVSKITE; PHOTOVOLTAIC EFFECT; PHYSICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SOLAR CELLS; STOICHIOMETRY; THIN FILMS; TIN OXIDES; TITANIUM OXIDES; VAPOR DEPOSITED COATINGS; X-RAY DIFFRACTION
- Descriptors DEC
- CHALCOGENIDES; COATINGS; COHERENT SCATTERING; DEPOSITION; DIFFRACTION; DIRECT ENERGY CONVERTERS; ELECTRON MICROSCOPY; EMISSION SPECTROSCOPY; EQUIPMENT; FILMS; FLUID FLOW; GAS FLOW; HALIDES; HALOGEN COMPOUNDS; IODIDES; IODINE COMPOUNDS; LEAD COMPOUNDS; LEAD HALIDES; MATERIALS; MICROSCOPY; MINERALS; OXIDE MINERALS; OXIDES; OXYGEN COMPOUNDS; PEROVSKITES; PHOTOELECTRIC CELLS; PHOTOELECTRIC EFFECT; PHOTOVOLTAIC CELLS; PHYSICAL PROPERTIES; SCATTERING; SOLAR EQUIPMENT; SPECTROSCOPY; SURFACE COATING; TIN COMPOUNDS; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2017 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.