Published January 24, 2005 | Version v1
Journal article

Dielectric characteristics and thermal stability of Ba6-3xNd8+2xTi18O54 thin films prepared by pulsed laser deposition

  • 1. Department of Material Science and Engineering and National Laboratory of Solid State Microstructures, Nanjing University, Hankou Road 22, Nanjing 210093 (China)

Description

Ba6-3xNd8+2xTi18O54 with x=0.25 (simply BNT) dielectric thin films with a thickness of 320 nm have been prepared by pulsed laser deposition. The analysis results of X-ray diffraction showed that the as-deposited BNT films are amorphous, and the amorphous state is stable against a postannealing at temperature up to 850 deg C. The dielectric constant of the BNT films has been determined to be about 80 with a low loss tan δ of about 0.006 at 1 MHz. The frequency dependence of the capacitance-voltage characteristics of BNT metal-insulator-metal capacitors is investigated. With the frequency increasing, the BNT capacitors showed gradually enhanced capacitor nonlinearity, which can be attributed to the Pt/BNT interface traps

Additional details

Identifiers

DOI
10.1016/j.tsf.2004.07.055;
PII
S0040-6090(04)00983-6;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
472
Journal Issue
1-2
Journal Page Range
p. 208-211
ISSN
0040-6090
CODEN
THSFAP

Optional Information

Copyright
Copyright (c) 2004 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.