Highly Charged Ion Sources

In this work a study is made for the factors affecting the production and extraction of highly charged ion beams. Discussion is made for the production of highly charged ions from: the conventional vacuum are ion sources (Pinning PIG and Duoplasmatron DP) and the recent trends type which are (Electron Beam Ion Sources EBIS, Electron Cyclotron Resonance Ion Sources ECRIS and Laser Ion source LIS). The highly charged ions with charge state <+10 and intensity <100 mu A can be produced from DP source. An intense ion beams (1 mu A-10 MA) with charge state higher than +10 can be produced from PIGIS, LIS and EBIS. The fully stripped N+7 , O+8 ,Ne+10 , Ar+18 have been extracted from the ECRIS while fully stripped Xe+54 has been extracted from EBIS. Improving the capabilities of the conventional RF ion source to produce multiply charged ions is achieved through the use of electron injection into the plasma or with the use of RF driven ion source. The later is based on coupling the RF power to the discharge through an internal antenna in vacuum are ion source. The argon ion species extracted from these upgraded RF ion sources could reach Ar+5