Published November 30, 2009 | Version v1
Journal article

Impact of ZnTe buffer on the electrical properties of n-type GaSb:Te films

  • 1. Department of Nano-Semiconductor, Korea Maritime University, Busan 606-791 (Korea, Republic of)
  • 2. Division of Mechatronics Engineering, Korea Maritime University, Busan 606-791 (Korea, Republic of)
  • 3. Faculty of Energy Resources Engineering, Jungwon University, Goesan 367-805 (Korea, Republic of)
  • 4. Neosemitech, Incheon 406-840 (Korea, Republic of)
  • 5. Department of Defense Science and Technology, Hoseo University, Asan 336-795 (Korea, Republic of)
  • 6. Center for Interdisciplinary Research, Tohoku University, Sendai 980-8577 (Japan)

Description

We have investigated on the molecular beam epitaxy (MBE) of Te-doped GaSb films on ZnTe buffer. Te-doped GaSb (GaSb:Te) films with and without ZnTe buffer were grown on (0 0 1) GaAs substrates. GaSb:Te/ZnTe/GaAs film revealed higher mobility (=631 cm2/V s) in comparison to GaSb:Te/GaAs film (=249 cm2/V s). To explain the higher mobility of GaSb:Te on ZnTe buffer, dislocation density and temperature dependence of Hall measurement results were analyzed. Temperature dependence of Hall measurement shows strong influence of the dislocation scattering, which indicates that dislocation reduction by the ZnTe buffer enhances the carrier mobility of GaSb films.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2009.05.159

Additional details

Identifiers

DOI
10.1016/j.apsusc.2009.05.159;
PII
S0169-4332(09)00733-8;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
256
Journal Issue
4
Journal Page Range
p. 1261-1264
ISSN
0169-4332
CODEN
ASUSEE

Conference

Title
4. vacuum and surface sciences conference of Asia and Australia
Acronym
VASSCAA-4
Dates
28-31 Oct 2008
Place
Matsue (Japan)

Optional Information

Copyright
Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.