Plasma transfer and technology of ion plasma etching

Technological process of ion plasma etching (IPE) is working out according to the idea about of elementary process which take place on the treatment surface. The principal mechanism of interaction between bombardment ions and atoms of surface is the process of transfer of impulse during spring collisions of displacement atoms. The final result of atom collisions may consist in what surface atoms will receive sufficient impulse and energy for extracting its from etching surface of material