Published October 5, 1992
| Version v1
Journal article
Modeling effects of cesium vapor injection in a volume H- ion source
Creators
- 1. Department of Electrical and Electronic Engineering, Faculty of Engineering, Yamaguchi University, Ube 755 (Japan)
Description
Effects of cesium vapor injection on H- production in a tandem source are studied theoretically by solving a set of particle balance equations in a steady-state hydrogen plasma. In particular, enhancement of H- production and its mechanism, effects of wall recombination of H for surface H- production, and the effectiveness of the tandem two-chamber system for H- optimization are discussed
Additional details
Publishing Information
- Journal Title
- AIP Conference Proceedings
- Journal Volume
- 287
- Journal Issue
- 1
- Journal Page Range
- p. 117-129.
- ISSN
- 0094-243X
- CODEN
- APCPCS
Conference
- Title
- Production and neutralization of negative ions and beams.
- Dates
- 9-13 Nov 1992.
- Place
- Upton, NY (United States).
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 26034691
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; S30: DIRECT ENERGY CONVERSION; S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CESIUM; DEUTERIUM IONS; ELECTRON REACTIONS; HYDROGEN IONS 1 MINUS; ION DENSITY; ION SOURCES; PLASMA SIMULATION; SCATTERING; SURFACE IONIZATION
- Descriptors DEC
- ALKALI METALS; ANIONS; CHARGED PARTICLES; ELEMENTS; HYDROGEN IONS; IONIZATION; IONS; LEPTON REACTIONS; METALS; NUCLEAR REACTIONS; SIMULATION
Optional Information
- Secondary number(s)
- CONF-921145--.