Published December 24, 1980 | Version v1
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Recent improvements in monomolecular resists

Description

This letter describes recent results obtained with ω-tricosenoic acid in the field of monomolecular electron-resists, following a thorough purification in the course of the synthesis. Sensitivity undergoes a hundredfold improvement and reaches 0.5 μC/cm2; contrast in increased from 0.7 to 2.4. These results seem to be due to an increase in length of the polymer. Better contrast improves resolution, which is now down to 600 A on a 900 A thick film. (authors)

Abstract (French)

Cette lettre decrit les derniers resultats obtenus dans le domaine des electronresists en couches monomoleoulaires avec l'acide ω-tricosenoique a la suite d'une purification extensive au cours de la synthese. La sensibilite est amelioree d'un facteur 100 et descend a 0,5 μC/cm2; le contraste passe de 0,7 a 2,4. Ce resultat semble du a l'augmentation de longueur des polymeres lineaires formes. Le gain de contraste a permis d'ameliorer la resolution, qui est maintenant de 600 A avec un film de 900 A d'epaisseur. (auteurs)

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Additional details

Additional titles

Original title (French)
Progres recents dans les resists monomoleculaires

Publishing Information

Imprint Pagination
9 p.
Report number
CEA-N--2188

Optional Information

Notes
3 refs.; Available from the INIS Liaison Officer for France, see the INIS website for current contact and E-mail addresses